optical lithography meaning in Chinese
光学平板刻法
光学制版
Examples
- The research results show that iil can get the high resolution more effectively than conventional optical lithography ( ol )
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。 - Being one of the key technologies of euvl , the alignment of optical lithography system affects directly the final imaging quality of the system
作为euvl关键技术之一，微缩投影光学系统的精密装调直接影响着系统的最终成像质量。 - With the development of electronic industry , integrated circuit ( ic ) technology plays an important role in the modern industry . as the technology of optical lithography acting as the kernel of 1c fabrication technology , it is attracted by all the countries of the world
在电子信息产业发展过程中，集成电路技术对现代化工业的发展和人们的生活起了极其重要的作用，而光刻技术是集成电路生产技术的核心和关键，倍受世界各国的关注。 - Extreme ultraviolet lithography ( euvl ) represents one of the promising technologies for supporting integrated circuit ( 1c ) industry ' s lithography needs during the first decade of the 21st century . this technology builds on conventional optical lithography experience and infrastructure , uses 11 - to 14 - nm photon illumination , and is expected to support multiple technology generation from 65 nm to 35 nm
极紫外投影光刻( euvl ， extremeultravioletlithography )技术作为下一代光刻技术中最佳候选技术，建立于可见/紫外光学光刻的诸多关键单元技术基础之上，工作波长为11 14nm ，适用于制造特征尺寸为65 35nm的数代超大规模集成电路，预计在2006年将成为主流光刻技术。 - Interferometirc lithographic technology incorporates laser , interference optics , diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by national natural science foundation of china . the research for this technology in theory , simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit , developing nanometer electronic and photoelectron devices , novel large screen panel display and novel lithographic equipment of our country
干涉光刻技术集激光、干涉和衍射光学及光学光刻于一体，是国家自然科学基金资助的微细加工技术和微电子领域的前沿研究课题，对其进行理论、模拟和实验研究，对推进光学光刻极限，发展我国纳米微电子和光电子器件、新型大屏幕平板显示器和新型光刻机具有重要的科学意义和广阔的应用前景。